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ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
SKU: iso_074814_179028
Published by ISO
Publication Year 2022
1 Edition
29 pages
Product Details
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).