Codes et normes - Achat
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
SKU: iso_074814_179028
Publié par ISO
Année de publication 2022
1 Edition
29 pages
détails du produit
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).